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Department of Electrical Engineering, Toyo University | 論文
- Silicon Etching Employing Negative Ion in SF_6 Plasma
- Growth of YBa_2Cu_3O_ Superconducting Thin Films on [111] Oriented Ag Films
- Affinity-Tagged Phosphorylation Assay by Matrix-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (ATPA-MALDI) : Application to Calcium/Calmodulin-Dependent Protein Kinase
- Study on the Mechanism of Silicon Chemical Mechanical Polishing Employing In Situ Infrared Spectroscopy
- Selective Processing of Individual Carbon-Nanotubes Using Atomic Force Microscopy Installed in Transmission Electron Microscope
- A New Inside-Type Segmented Coil Antenna for Uniformity Control in a Large-Area Inductively Coupled Plasma
- Generation of Integrated Atmospheric-Pressure Microplasmas
- Localized Plasma Processing of Materials Using Atmospheric-Pressure Microplasma Jets
- Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
- P-136 A New Practical Proteomic Method for Quantitative Analysis of Proteins Using Stable Isotope-labeling Small Organic Molecules
- Crow-Fukase Syndrome with Ischemic Cardiomyopathy
- Load and Strain Histories for CFRP Laminates under Low-Velocity Impact
- Conelike Defect in Deep Quartz Etching Employing Neutral Loop Discharge
- Numerically Controlled Dry Etching Technology for Flattening of Si Wafer which Employs SF_6/H_2 Downstream Plasma
- Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement : Etching and Deposition Technology
- Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement
- Transcriptional Regulation of Neuronal Genes and Its Effect on Neural Functions : NAD-Dependent Histone Deacetylase SIRT1 (Sir2α)
- Lhermitte's Sign in Alcoholic Myelopathy without Portosystemic Shunting : MRI Evaluation
- Characteristics of Very High-Aspect-Ratio Contact Hole Etching
- Photoexcited Anisotropic Etching of Single-Crystalline Silicon