スポンサーリンク
Department of Control and Instrumentation Engineering, Korea University | 論文
- Recovery of Silicon Surface after Reactive Ion Etching of SiO_2 using CHF_3/C_2F_6 Plasma
- Size effect of substitutional alkaline-earth elements on the electrical and structural properties of LaMnO3 films
- Synchronization control for physics-based collaborative virtual environments with shared haptics
- Sex differences in the postural sway characteristics of young and elderly subjects during quiet natural standing
- Comparison of Effective Working Electrode Areas on Planar and Porous Silicon Substrates for Cholesterol Biosensor
- Energy Level Structure of Amorphous Silicon Carbide
- Infrared-Cut Filter : Optics and Quantum Electronics
- Etching Characteristics and Mechanism of ZnO and Ga-Doped ZnO Thin Films in Inductively Coupled HBr/Ar/CHF3 Plasma
- Etching Characteristics of In2O3 and SnO2 Thin Films in an Inductively Coupled HBr/Ar Plasma: Effects of Gas Mixing Ratio and Bias Power
- Etching Characteristics of VO2 Thin Films Using Inductively Coupled Cl2/Ar Plasma
- Kinetics of Chemical Changes in Phenol Formaldehyde Based Polymeric Films Etched in N2O and O2 Inductively Coupled Plasmas: A Comparative Study
- Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas
- Etching Characteristics and Mechanism of InP in Inductively Coupled HBr/Ar Plasma
- Etching Characteristics of Manganese-Doped Zinc Sulfide Film Using Cl2/CF4 Inductively Coupled Plasma
- Etching Characteristics and Mechanisms of Pb(Zr,Ti)O3, Pt, and SiO2 in an Inductively Coupled HBr/Cl2 Plasma
- Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl2/Ar Inductively Coupled Plasma
- Etching Behavior and Mechanism of In- and Ga-Doped ZnO Thin Films in Inductively Coupled BCl3/Cl2/Ar Plasmas
- Influence of Ar and NH3 Plasma Treatment on Surface of Poly(monochloro-para-xylylene) Dielectric Films Processed in Oxygen Plasma
- A Multimode Relayed Piezoelectric Cantilever for Effective Vibration Energy Harvesting
- Effect of reflector bias voltage on the nanocrystallization of silicon thin films by reactive particle beam assisted chemical vapor deposition