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Department of Bioscience and Biotechnology, Faculty of Agriculture, University of the Ryukyus | 論文
- Isolation and Characterization of Alginic Acid from Commercially Cultured Nemacystus decipiens (Itomozuku)
- Development of a Modified Positive Selection Medium That Allows to Isolate Aspergillus oryzae Strains Cured of the Integrated niaD-Based Plasmid
- 1,1-Diphenyl-2-picrylhydrazyl Radical Scavenging Activity and Tyrosinase Inhibitory Effects of Constituents of Sugarcane Molasses
- Conjugated Linoleic Acid (CLA) Inhibits Fatty Acid Synthetase Activity in Vitro(Food & Nutrition Science)
- A Novel Fermented Food Product Prepared from Soybean Protein-Calcium-Gel with Monascus Fungus : Changes in Protein and Nitrogen Compounds during Fermentation
- Phylogenetic Relationship of Symbiotic Archaea in the Gut of the Higher Termite Nasutitermes takasagoensis Fed with Various Carbon Sources
- Efficacy of extracting solvents to chemical components of kava (Piper methysticum) roots
- Current status of biological control of paddy weeds in Vietnam
- Influence of Feed Components on Symbiotic Bacterial Community Structure in the Gut of the Wood-Feeding Higher Termite Nasutitermes takasagoensis
- Human Tyrosinase Inhibitor in Rum Distillate Wastewater
- Structural Study of Fucoidan from the Brown Seaweed Hizikia fusiformis
- Antioxidant and Antibacterial Activities of Rumex japonicus HOUTT. Aerial Parts(Pharmacology)
- Molecular Origin of the Rheological Characteristics of ι-Carrageenan Isolated from Togekirinsai (Eucheuma serra)
- Long Ni Cantilever Fabrication with New Sacrificial Process
- A Monte Carlo Study of Magnetic Domain Images in a Spin-Polarized Scanning Electron Microscope
- Fabrication of a New Electrostatic Linear Actuator
- In Situ Measurements of the Resist Etch Rate for Submicron Patterns
- Resist Etching with Parellel-Plate RF Plasmas Enhanced by a Cusp Magnetic Field
- Novel Single-Step Rapid Thermal Oxynitridation Technology for Forming Highly Reliable Electrically Erasable Programmable Read-Only Memory Tunnel Oxide Films
- Kinetics of Rapid Thermal Oxidation of Silicon