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Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University | 論文
- Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N_2 and H_2 Gas Chemistry
- Synthesis of Polytetrafluoroethylene-like Films by a Novel Plasma Enhanced Chemical Vapor Deposition Employing Solid Material Evaporation Technique
- CH_3 Radical Density in Electron Cyclotron Resonance CH_3OH and CH_3OH/H_2 Plasmas
- CW Laser-Induced Fluorescence Study of SiH_2+ SiH_4 Reaction : Dominance of Two-Body Reaction Channel in Low-Pressure Silane Plasma
- Translational Temperature Measurement for SiH_2 in RF Silane Plasma Using CW Laser Induced Fluorescence Spectroscopy
- Evaluation of CF_2 Radical as a Precursor for Fluorocarbon Film Formation in Highly Selective SiO_2 Etching Process Using Radical Injection Technique
- CF_X (X=1-3) Radical Measurements in ECR Etching Plasma Employing C_4F_8 Gas by Infrared Diode Laser Absorption Spectroscopy
- Characteristics of Fluorocarbon Radicals and CHF_3 Molecule in CHF_3 Electron Cyclotron Resonance Downstream Plasma
- CF_X(X=1-3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition ( Plasma Processing)
- Cleaning of Glass Disk in Oxygen Plasma by Using Compact Electron-Beam-Excited Plasma Source
- Protective Effect of FR168888, a New Na^+/H^+ Exchange Inhibitor, on Ischemia and Reperfusion-Induced Arrhythmia and Myocardial Infarction in Rats : In Comparison With Other Cardioprotective Compounds
- A Case of Fulminant Peritonitis Caused by Streptococcus mitis in a Patient on Peritoneal Dialysis
- Kinetics of CF_x (x = 1-3) Radicals and Electrons in RF CF_4-H_2, CHF_3-H_2 and CHF_3-O_2 Plasmas
- CF_3, CF_2 and CF Radical Measurements in RF CHF_3 Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy ( Plasma Processing)
- Squeezed Vacuum Generation Using Symmetric Nonlinear Polarization Interferometer : Optics and Quantum Electronics
- Nonlinear Polarization Interferometer for Photon-Number Squeezed Light Generation : Optics and Quantum Electronics
- Analysis of Generation Mechanism of Photon-Number Squeezed Light Using Ultrashort Pulse and Asymmetric Fiber Loop Mirror
- Characteristics of Intensity Noise Reduction of Optical Pulses Using Variabel Spectral Filters and Optical Fibers
- Measurements of the CF Radical in DC Pulsed CF_4/H_2 Discharge Plasma Using Infrared Diode Laser Absorption Spectroscopy
- Spatial Distribution of SiH_3 Radicals in RF Silane Plasma