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Department Of Materials Engineering Hanyang University | 論文
- Hydrogenation of Polysilicon Thin Film Transistors Using Inductively Coupled Plasma
- Application of Electron Cyclotron Resonance Plasma Thermal Oxidation to Bottom Gate Polysilicon Thin Film Transistors
- Suppression of Leakage Current in n-Channel Polysilicon Thin-Film Transistors Using NH_3 Annealing
- Remote Plasma-Assisted Metal Organic Chemical Vapor Deposition of Tantalum Nitride Thin Films with Different Radicals
- Barrier Metal Properties of Amorphous Tantalum Nitride Thin Films between Platinum and Silicon deposited using Remote Plasma Metal Organic Chemical Vapor Method
- A Study on the Spray Structure of High Pressure Gasoline Injection
- Processing of Net-shaped Fe-Ni Nanomaterials by Powder Injection Molding (特集 自動車用焼結部品のニーズとMIM等のネットシェープ化,高機能化技術)
- A new processing route for net-shaped nanoparticulate materials
- Endurance Characteristics and Degradation Mechanism of Polysilicon Thin Film Transistor EEPROMs with Electron Cyclotron Resonance N_2O-Plasma Gate Oxide
- High-Performance EEPROMs Using N- and P-Channel Poly-Si TFTs with ECR N2O-Plasma Oxide
- Effect of Bottom Polysilicon Doping on the Reliability of Interpoly Oxide Grown Using Electron Cyclotron Resonence N_2O-Plasma
- Short Channel Effects in N- and P-Channel Polycrystalline Silicon Thin Film Transistors with Very Thin Electron Cyclotron Resonance N_2O-Plasma Gate Dielectric
- Short-Channel Effects in N- and P-Channel Polysilicon Thin Film Transistors with Very Thin ECR N_2O-Plasma Gate Dielectrics
- Highly Reliable Interpoly Oxide Using ECR N_2O-Plasma for Next Generation Flash Memory
- Highly Anisotropic Etching of Tungsten-Nitride for an X-Ray Mask Absorber with an Inductively Coupled Plasma System
- Effects of WSi_X-Polycide Gate Processes on MOSFET Reliability and Characteristics
- Effects of WSi_X-Polycide Gate Processes on MOSFET Reliability and Characteristics
- Invited Effects of WSix-Polycide Gate Processes on MOSFET Reliability and Characteristics (2001 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices(AWAD 2001))
- Electrical and Microstructural Degradation with Decreasing Thickness of (Ba, Sr)TiO_3 Thin Films Deposited by RF Magnetron Sputtering
- Electrical Characterization of Nano-Floating Gated Silicon-on-Insulator Memory with In_2O_3 Nano-Particles Embedded in Polyimide Insulator