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Department Of Electronic Engineering Tohoku University | 論文
- Risk Factors for Heatstroke among Japanese Forestry Workers
- Changes in Health Habits of Female Shift Workers
- フレキシブルプロセッサ : パーソナルユースHWエミュレータ向け動的再構成可能ロジックアレイ(VLSI回路, デバイス技術(高速, 低電圧, 低電力))
- フレキシブルプロセッサ : パーソナルユースHWエミュレータ向け動的再構成可能ロジックアレイ(VLSI回路, デバイス技術(高速, 低電圧, 低電力))
- 有機物汚染がシリコン素子に与える影響
- Nitrogen Profile Study for SiON Gate Dielectrics of Advanced DRAM
- Data Analysis Technique of Atomic Force Microscopy for Atomically Flat Silicon Surfaces
- Optimization of Thermal Preprocessing for Efficient Combustion of Woody Biomass(Recent Advances in Materials and Processing (I))
- Low Contact Resistance with Low Schottky Barrier for N-type Silicon Using Yttrium Silicide
- Very Low Bit Error Rate in Flash Memory using Tunnel Dielectrics formed by Kr/O_2/NO Plasma Oxynitridation
- Double Layer Dynamics in a Collisionless Magnetoplasma
- Stationary Double Layers in a Collisionless Magnetoplasma
- Improved Transconductance and Gate Insulator Integrity of MISFETs with Si_3N_4 Gate Dielectric Fabricated by Microwave-Excited High-Density Plasma at 400℃
- Low Resistivity PVD TaNx/Ta/TaNx Stacked Metal Gate CMOS Technology Using Self-Grown bcc-Phased Tantalum on TaNx Buffer Layer
- A Statistical Analysis of Distributions of RTS Characteristics by Wide-Range Sampling Frequencies
- A Statistical Analysis of Distributions of RTS Characteristics by Wide-Range Sampling Frequencies
- A Material of Semiconductor Package with Low Dielectric Constant, Low Dielectric Loss and Flat Surface for High Frequency and Low Power Propagation(Session2: Silicon Devices I)
- A Material of Semiconductor Package with Low Dielectric Constant, Low Dielectric Loss and Flat Surface for High Frequency and Low Power Propagation(Session2: Silicon Devices I)
- Ovarian sclerosing stromal tumor presenting as Meigs' syndrome with elevated CA-125
- 27aA04 完全電離無衝突磁化プラズマ中の径方向電位分布制御(プラズマ基礎・応用)