スポンサーリンク
Department Of Electronic Engineering Tohoku University | 論文
- Electrostatic Potentials of Stationary Plasma Flows Along Magnetic Well and Hill
- New Microwave Launcher for Producing ECR Plasmas without Window Contamination I. : Excitation of Electron Cyclotron Wave
- A Mechanism for Potential-Driven Electrostatic Ion Cyclotron Oscillations in a Plasma
- Large-Diameter Reactive Plasma Produced by a Plane Electron Cyclotron Resonance Antenna ( Plasma Processing)
- Damage-Free Microwave-Excited Plasma Contact Hole Etching without Carrier Deactivation at the Interface between Silicide and Heavily-Doped Si
- Defect Engineering in Epitaxial Layers over Porous Silicon for ELTRAN^【○!R】 SOI Wafers
- Extremely Low Si Etching (
- Current Progress in Epitaxial Layer Transfer (ELTRAN^[○!R]) (Special Issue on SOI Devices and Their Process Technologies)
- Advanced Quality in Epitaxial Layer Transfer by Bond and Etch-back of Porous Si
- Cyclic Peptides from Higher Plants. XXVIII. Antitumor Activity and Hepatic Microsomal Biotransformation of Cyclic Pentapeptides, Astins, from Aster tataricus
- Probe Measurements in a Negative Ion Plasma
- Plasma Potential Formation Due to Localized Radio-Frequency Electric Fields
- Analysis of Ion Species in Potassium-Fullerene Plasmas
- Electrostatic Ion-Cyclotron Oscillations Induced by an Emissive Disc Plate Floating in a Plasma
- Electron Injections from a Floated Plate into a Collisionless Plasma
- Plasma Particle Drifts Due to Traveling Waves with Cyclotron Frequencies
- Neutralized, Collisionless, Surface Ionized Ion Beam Source
- Optimum Condition for Spatial Ion Cyclotron Resonance in a Multiple Magnetic Mirror Field
- Critical Thickness of Antiferromagnetic Layer in Exchange Biasing Bilayer System(Condensed matter: structure and mechanical and thermal properties)
- Fabrication of Deep, Narrow Holes in Steel Using High-speed Electrical Discharge Machine with Conductive Aqueous Working Fluid