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Department Of Electrical Engineering Toyo University | 論文
- ラジアルラインスロットアンテナを用いた大口径均一プラズマの生成
- ラジアルラインスロットアンテナを用いたプラズマエッチング装置
- ナノピラー構造体が電気浸透流に及ぼす影響の評価
- 極微量全血分離・分析を目指したヘルスケアチップの創製
- Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
- Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
- RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma
- Microloading Effect in Highty Selective Si0_2 Contact Hole Etching Employing Inductively Coupled Plasma
- Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
- High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
- RF Self-Bias Characteristics in Inductively Coupled Plasma
- Al Etching Characteristics Ernploying Helicon Wave Plasma
- Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
- Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet : Etching
- Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet
- Si Etching with Low Ion Energy in Low-Pressure Electron Cyclotron Resonance Plasma Generated by Longitudinal and Multipole Magnetic Fields
- High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields : Etching and Deposition Technology
- High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields
- ナノポアを通過する長鎖DNAのイメージング解析 : DNAの核膜孔通過過程のモデリングを目指して
- 18pYF-11 マイクロ・ナノチップ中における長鎖DNAのダイナミクスの解析