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Department Of Electrical Engineering Toyo University | 論文
- カーボンナノチューブフィールドエミッターのI-V特性と先端構造
- Gap-filling of Cu Employing Sustained Self-Sputtering with Inductively Coupled Plasma Ionization
- Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
- Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
- Highly Selective SiO_2/Si Etching and Related Kinetics in Time-Modulated Helicon Wave Plasma
- SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
- Mechanism of Cloudy Surface Generation on Si Wafer Employing Numerically Controlled Local Dry Etching (NC-LDE)
- In-Situ X-Ray Photoelectron Spectroscopy of Reactive-Ion-Etched Surfaces of Indium-Tin Oxide Film Employing Alcohol Gas
- Fluorescence Emission Control of Long DNA Molecules Adsorbed on microelectrode Surfaces by External Voltage
- Study on the Mechanisms of Chemical Mechanical Polishing on Copper and Aluminum Surfaces Employing In Situ Infrared Spectroscopy
- Molecular Detection in a Microfluidic Device by Streaming Current Measurements
- Translocation of a Long DNA Chain Passing Through a Nanofabricated Pore
- Study on Elemental Technologies for Creation of Healthcare Chip Fabricated on Polyethylene Terephthalate Plate
- 水素+水蒸気プラズマダウンフローへのNF_3添加によるシリコン表面の自然酸化膜除去
- テトラフルオロエチルトリフルオロメチルエーテル(HFE 227)への有機シラン添加による高選択比・高アスペクト比酸化膜エッチング
- Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
- 多項目同時測定ヘルスケアチップ用マイクログルコースセンサーの創製
- Cleaning of Silicon Surfaces by NF_3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment
- Cleaning of Silicon Surfaces by NF_3 Added Hydrogen and Water Vapor Plasma Downstream Treatment
- 2.4GHzフロントエンドAlN/α-Al_2O_3 SAWマッチトフィルタ