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Central Research Laboratory, HITACHI, LTD. | 論文
- Surface Reaction Induced by Multiply-Charged Ions
- Photon-Stimulated Ion Desorption from Semiconductor Surfaces
- Negative Tone Dry Development of Si-Containing Resists by Laser Ablation
- X-Ray Lithography with a Wet-Silylated and Dry-Developed Resist
- Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process
- New Dry Surface-Imaging Process for X-Ray Lithography
- Simulation of AZ-PN100 Resist Pattern Fluctuation in X-Ray Lithography, Including Synchrotron Beam Polarization
- Freeze-Drying Process to Avoid Resist Pattern Collapse
- X-ray Mask Technology utilizing an Optical Stepper : X-Ray Lithography
- Nanofabrication with a Novel EB System with a Large and Stable Beam Current
- Preparatory Study for the Matrix-Pattern Imaging, BE System
- Design and Evaluation of an Electron Objective Lens System with Two Lenses and Two Defiectors
- Analysis of Eddy Current Effects in an Electron Optical Column
- Cell Projection Lithography with Scattering Contrast
- XY-Stage Driving Electron-Beam Mastering with Nanometer-Accuracy Positioning for High-Density Optical Disk
- InAsSb Quantum Dots Grown on GaAs Substrates by Molecular Beam Epitaxy
- Preparation of YBa_2Cu_3O_ Superconducting Thin Films by RF-Magnetron Sputtering
- Metallugical Analysis of Mix-Phase Y-Ba-Cu Oxides
- 240-nm Pitch Aluminum Interconnects Formation by UHF-ECR Plasma Etching Incorporating TM Bias and Novel-Gas Chemistry
- InAlAs/InGaAs HEMTs with Uniform Threshold Voltage Fabricated by Selective Wet-Etching Using Adipic Acid