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Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S | 論文
- Characterization of Charged Traps near Si-SiO_2 Interface in Photo-CVD SiO_2 Film
- Theoretical Analysis of Oxygen-Excess Defects in SiO_2 Thin Film by Molecular Orbital Method
- Photoluminescence and Its Excimer Laser Irradiation Effects in SiO_2 Film Prepared by Photo-Induced Chemical Vapor Deposition
- Low-Temperature Preparation of Ferroelectric Sr_2(Ta_, Nbx)_2O_7 Thin Films by Pulsed Laser Deposition and Their Application to MFIS Structure
- Low-Temperature Preparation of Ferroelectric Sr2(Ta1-x,Nbx)2O7 Thin Films by Pulsed Laser Deposition and Their Application to Metal-Ferroelectric- Insulator-Semiconductor-FET
- A Significant Improvement in Memory Retention of Metal-Ferroelectric-Insulator-Semiconductor Structure for One Transistor-Type Ferroelectric Memory by Rapid Thermal Annealing
- A Fatigue-Tolerant MFOS Structure with Large Memory Window of 3.6V Using Sr-Deficient and Bi-Excess SBTO Ferroelectric Film Prepared on SiO_2/Si Low Temperature by PLD Method
- Analysis and Improvement of Retention Time of Memorized State of Metal-Ferroelectric-Insulator-Semiconductor Structure for Ferroelectric Gate FET Memory
- Contactless Characterization of Fixed Charges in HfO2 Thin Film from Photoreflectance
- A Low Temperature Preparation of BaTiO3 Thin Film by Sol-Gel-Hydrothermal Treatment below 210°C
- Nondestructive and Contactless Monitoring Technique of Si Surface Stress by Photoreflectance
- Natural-Superlattice-Structured Ferroelectric Bi4Ti3O12–SrBi4Ti4O15 Thin Films Prepared by Pulsed Laser Deposition
- Preparation of $m=1--2$ Series Natural-Superlattice-Structured Bismuth-Layer-Structured Ferroelectric Thin Films
- Synchrotron Radiation-Induced Nitrization and Oxidation on Si Surface at Low Temperature
- Low-Temperature Preparation and Characterization of (Pb,Ba)TiO3 Thin Film by Sol–Gel and Hydrothermal Treatment
- Preparation and Characterization of High-$k$ Praseodymium and Lanthanoid Oxide Thin Films Prepared by Pulsed Laser Deposition