Hoshino Masataka | Fujitsu Laboratories Lid.

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概要

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著作論文

Chemical-Mechanical Polishing of Metalorganic Chemical-Vapor-Deposited Gold for LSI Interconnection
Surface Morphology and Line Fill Properties of Gold Grown by Organometallic Chemical Vapor Deposition
A Mass Spectrometric Study of the Decomposition of Trimethylgallium (TMGa) with Trimethylarsine (TMAs)
Observation of Donor-Related Deep Levels in Ga_xIn_P (0.52≦x≦0.71) : Semiconductors and Semiconductor Devices
Two-Dimensional-Electron Gas in Undoped and Selectively-Doped GaInP/GaAs Heterostructures Grown by Chloride-Vapor-Phase Epitaxy
Near-Band-Edge Photoluminescenee of High-Purity Ga_xIn_P Grown by Chloride Vapor-Phase Epitaxy
Donor-Related Deep Level in S-Doped Ga_In_P Grwon by Chloride VPE
Photoluminescence Excitation Spectroscopy of In_Ga_,As/InP Multi-Quantum-Well Heterostructures
Shallow and Deep Donor Levels in S-Doped Ga_In_P Grown by Chloride VPE
Two-Dimensional Electron Gas at GaAs/Ga_In_P Heterointerface Grown by Chloride Vapor-Phase Epitaxy
Growth of InGaAsP Quaternary by Chloride VPE
Pyrolysis of Trimethylgallium on GaAs Surfaces Observed by Pulse Surface Reaction Rate Analysis

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