KATOH Yujiro | NTT Opto-Electronics Laboratories
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概要
関連著者
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KATOH Yujiro
NTT Opto-Electronics Laboratories
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Katoh Y
Ntt Opto-electronics Laboratories
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Sugimoto N
National Institute For Environment Studies
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SUGIMOTO Naoto
NTT Opto-Electronics Laboratories
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Tate A
Ntt Photonics Laboratories Ntt Corporation
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TATE Akiyuki
NTT Opto-electronics Laboratories
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Shibukawa A
Ntt Opto-electronics Laboratories
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Shibukawa Atsushi
Ntt Opto-electronics Laboratories
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ASANO Hidefumi
NTT Opto-Electronics Laboratories
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MICHIKAMI Osamu
NTT Opto-Electronics Laboratories
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Michikami O
Iwate Univ. Morioka‐shi Jpn
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SHIBUKAWA Atsushi
NTT Opto-eletctronics Laboratories
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Tanabe K
Superconductivity Research Laboratory Istec
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Tanabe K
Ntt Interdisciplinary Res. Lab. Ibaraki Jpn
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Tanabe K
Istec Tokyo Jpn
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Tanabe Keiichi
Ntt Electrical Communications Laboratories
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Tanabe K
Ntt Interdisciplinary Research Laboratories
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Asahi M
Ntt Interdisciplinary Res. Lab. Ibaraki Jpn
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Asahi Masayoshi
Ntt Interdisciplinary Research Laboratories
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ASAHI Masayoshi
NTT Opto-Electronics Laboratories
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TANABE Keiichi
NTT Optoelectronics Laboratories
著作論文
- Low-Temperature Growth of High-T_c Bi-Sr-Ca-Cu-O Films by Magnetron Sputtering : Electrical Properties Condensed Matter
- Preparation of YBaCuO Thin Film dc SQUID : Electrical Properties of Condensed Matter
- Tunneling Measurements of Thin Film Y-Ba-Cu-O/Nb Junctions
- Fabrication of High-T_c Oxide Superconductor Tunnel Junctions
- Ridge Structures Formed on Nd_3Ga_5O_ and Sm_3Ga_5O_ Single Crystal Substrates
- Scanning Electron Microscope Observation of Ridge Structures Formed on (100) and (110) Gd_3Ga_5O_ Substrates
- Preparation of Substituted Y_3Fe_5O_ Single-Mode Buried Waveguides on a [1 0 0] Oriented Gd_3Ga_5O_ Substrate
- [110]-Directed Ridge Formation of Epitaxial Y_3Fe_5O_ Film Grown on [111]-Oriented Gd_3Ga_5O_
- Ion Incident Angle Dependence of Ridge Shapes Formed on [111] Oriented Gd_3Ga_5O_ by Ion Beam Etching
- Ar Ion-Beam Etching of Gadolinium-Gallium Garnet
- Formation of Ridges on Gd_3Ga_5O_ by Ion-Beam Etching and Subsequent Phosphoric Acid Treatment Utilizing Tri-Layered Etching Mask