ASAI Masayuki | Semiconductor Equipment System Laboratory, Hitachi Kokusai Electric Inc.

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概要

• Asai Masayukiの詳細を見る
• 同名の論文著者
• Semiconductor Equipment System Laboratory, Hitachi Kokusai Electric Inc.の論文著者

関連著者

• 堀田 将

  北陸先端科学技術大学院大学材料科学研究科

• YAMAMOTO Kazuhiko

  ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio

• NIWA Masaaki

  ULSI Process Technology Development Center, Matsushita Electronics Corp.

• HORII Sadayoshi

  Semiconductor Equipment System Laboratory, Hitachi Kokusai Electric Inc.

• Miya Hironobu

  Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.

• ASAI Masayuki

  Semiconductor Equipment System Laboratory, Hitachi Kokusai Electric Inc.

• Niwa M

  Matsushita Electronics Corp. Kyoto Jpn

• Hayashi Shigenori

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation

• Hayashi Shigenori

  Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.

• Hayashi Shigenori

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.

• Niwa M

  Ulsi Process Technology Development Center Matsushita Electronics Corp.

• Niwa M

  Department Of Materials Science And Engineering Tokyo Denki University

• Niwa Masaaki

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.

• Miya Hironobu

  Semiconductor Equipment Division Hitachi Kokusai Electric Inc.

• KANEKO Isao

  Specialty Chemicals Research Center, Shin-Etsu Chemical Co., Ltd.

• ISHIHARA Toshinobu

  Specialty Chemicals Research Center, Shin-Etsu Chemical Co., Ltd.

• Horii Sadayoshi

  Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.

• Kaneko Isao

  Specialty Chemicals Research Center Shin-etsu Chemical Co. Ltd.

• Asai Masayuki

  Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.

• Ishihara Toshinobu

  Specialty Chemicals Research Center Shin-etsu Chemical Co. Ltd.

• Yamamoto Kazuhiko

  ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.

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著作論文

• Metal-Organic Chemical Vapor Deposition of HfO_2 by Alternating Supply of Tetrakis-Diethylamino-Hafnium and Remote-Plasma Oxygen
• Metalorganic Chemical Vapor Deposition of HfO_2 Films through the Alternating Supply of Tetrakis(1-methoxy-2-methyl-2-propoxy)-Hafnium and Remote-Plasma Oxygen

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