Kamata Yoshiki | Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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概要
- KAMATA Yoshikiの詳細を見る
- 同名の論文著者
- Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporationの論文著者
関連著者
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Kamata Yoshiki
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Nishiyama Akira
Advanced LSI Technology Laboratory, Corporate R & D Center, Toshiba Corporation
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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KAMATA Yoshiki
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Kamimuta Yuuichi
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Ino Tsunehiro
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Kamata Yasushi
Methane Hydrate Research Laboratory National Institute Of Advanced Industrial Science And Technology
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KAMIMUTA Yuuichi
Advanced LSI Technology Laboratory, Toshiba Corp.
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Nishiyama Akira
Department Of Pharmacology Kagawa University Medical School
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Ono M
Sony Corp. Tokyo Jpn
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Koyama Masato
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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ONO Mizuki
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Ono Mizuki
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Ono Mizuki
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Iijima Ryosuke
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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INO Tsunehiro
Advanced LSI Technology Laboratory, Corporate Research and Development Center, TOSHIBA Corporation
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Nishiyama Akira
Faculty Of Medicine Department Of Pharmacology Kagawa University
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Kamimuta Yuuichi
Advanced Lsi Technology Laboratory Corporate Research And Development Center Toshiba Corporation
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Ino Tsunehiro
Advanced Lsi Technology Laboratory Corporate Research And Development Center Toshiba Corporation
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Uchida Tsutomu
National Institute Of Advanced Industrial Science And Technology (aist)
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Shimada W
National Institute Of Advanced Industrial Science And Technology (aist)
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Shimada Wataru
National Institute Of Advanced Industrial Science And Technology(aist)
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Koyama Masato
Advanced LSI Technology Laboratory, Corporate R & D Center, Toshiba Corporation
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Nagao Jiro
Toho University Ohashi Medical Center Hospital Third Department Of Surgery
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Nagao J
Hokkaido Univ. Hokkaido Jpn
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Nagao Jiro
National Institute Of Advanced Industrial Science And Technology(aist)
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Narita Hideo
Methane Hydrate Research Laboratory National Institute Of Advanced Industrial Science And Technology
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Narita Hideo
National Institute Of Advanced Industrial Science And Technology(aist)
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Ebinuma Takao
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Sapporo Jpn
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Oyama Hiroyuki
National Institute Of Advanced Industrial Science And Technology(aist)
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Oyama Hiroyuki
National Institute Of Advanced Industrial Science And Technology (aist)
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Kamata Yasushi
National Institute Of Advanced Industrial Science And Technology(aist)
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Takeya S
Methane Hydrate Research Laboratory National Institute Of Advanced Industrial Science And Technology
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Takeya Satoshi
National Institute Of Advanced Industrial Science And Technology(aist)
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IIJIMA Ryosuke
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation
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Iijima Ryosuke
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Takeya Satoshi
National Institute Of Advanced Industrial Science And Technology (aist)
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Narita Hideo
National Institute Of Advanced Industrial Science And Technology (aist)
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Kamata Yasushi
National Institute Of Advanced Industrial Science And Technology (aist)
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Shimada Wataru
National Institute Of Advanced Industrial Science And Technology (aist)
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Nagao Jiro
National Institute of Advanced Industrial Science and Technology (AIST), Tsukisamu-higashi, Sapporo 062-8517, Japan
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Kamata Yoshiki
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Ino Tsunehiro
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Iijima Ryosuke
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Kamimuta Yuuichi
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
著作論文
- Elevated Extension Structure for 35nm MOSFETs
- Elevated Extension Structure for 35nm MOSFETs
- Influences of Activation Annealing on Characteristics of Ge p-MOSFET with ZrO_2 Gate Dielectric
- Direct comparison of ZrO_2 and HfO_2 on Ge substrate in terms of the realization of ultra-thin high-k gate stacks
- Gas Separation Method Using Tetra-n-butyl Ammonium Bromide Semi-Clathrate Hydrate
- Influences of Annealing Temperature on Characteristics of Ge p-Channel Metal Oxide Semiconductor Field Effect Transistors with ZrO2 Gate Dielectrics
- Direct Comparison of ZrO2 and HfO2 on Ge Substrate in Terms of the Realization of Ultrathin High-$\kappa$ Gate Stacks