Kaneta Chioko | Fujitsu Laboratories Limited
スポンサーリンク
概要
関連著者
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Kaneta Chioko
Fujitsu Laboratories Limited
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KANETA Chioko
FUJITSU Laboratories Ltd.
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YAMASAKI Takahiro
Fujitsu Laboratories Limited
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Tamura Naoyoshi
Fujitsu Lab. Ltd. Tokyo Jpn
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Tamura Naoyoshi
Fujitsu Laboratories Ltd.
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MORI Hiroko
FUJITSU LSI Quality Assurance Div.
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EHARA Hideo
FUJITSU LSI Quality Assurance Div.
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MATSUYAMA Hideya
FUJITSU LSI Quality Assurance Div.
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SHONO Ken
FUJITSU LSI Quality Assurance Div.
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TERAKURA Kiyoyuki
JRCAT-NAIR
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TAKAHASHI Norihiko
Fujitsu Laboratories Limited
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Tamura Naoyoshi
Fujitsu Lab. Ltd.
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UCHIYAMA Toshihiro
JRCAT-ATP
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UDA Tsuyoshi
JRCAT-ATP
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Terakura Kiyoyuki
Jrcat Central 4:national Institute Of Advanced Industrial Science And Technology Research Institute
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Kaneta Chioko
Fujitsu Laboratories Ltd., 10-1, Morinosato-Wakamiya, Atsugi 243-01, Japan
著作論文
- Investigation of Degradation model for Ultra-thin Gate Dielectrics
- Trap Generation Induced by Local Distortion in Amorphous Silicon Dioxide Film
- The Effect of Nitrogen on Thermal Diffusion in HfO_2-based Gate Dielectrics
- Hole Trapping Due to Impurities in Amorphous Silicon Dioxide
- Interface States due to Intrinsic Defects in Si(100)/SiO_2
- Trap Generation Induced by Local Distortion in Amorphous Silicon Dioxide Film