KANETA Chioko | FUJITSU Laboratories Ltd.
スポンサーリンク
概要
関連著者
-
KANETA Chioko
FUJITSU Laboratories Ltd.
-
Kaneta Chioko
Fujitsu Laboratories Limited
-
Tamura Naoyoshi
Fujitsu Lab. Ltd. Tokyo Jpn
-
Tamura Naoyoshi
Fujitsu Laboratories Ltd.
-
MORI Hiroko
FUJITSU LSI Quality Assurance Div.
-
EHARA Hideo
FUJITSU LSI Quality Assurance Div.
-
MATSUYAMA Hideya
FUJITSU LSI Quality Assurance Div.
-
SHONO Ken
FUJITSU LSI Quality Assurance Div.
-
TAKAHASHI Norihiko
Fujitsu Laboratories Limited
-
YAMASAKI Takahiro
Fujitsu Laboratories Limited
-
Tamura Naoyoshi
Fujitsu Lab. Ltd.
著作論文
- Investigation of Degradation model for Ultra-thin Gate Dielectrics
- Trap Generation Induced by Local Distortion in Amorphous Silicon Dioxide Film
- The Effect of Nitrogen on Thermal Diffusion in HfO_2-based Gate Dielectrics
- Hole Trapping Due to Impurities in Amorphous Silicon Dioxide