The Effect of Nitrogen on Thermal Diffusion in HfO_2-based Gate Dielectrics

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概要

• 論文の詳細を見る
• 2006-09-13

著者

• KANETA Chioko

  FUJITSU Laboratories Ltd.

• Kaneta Chioko

  Fujitsu Laboratories Limited

• TAKAHASHI Norihiko

  Fujitsu Laboratories Limited

• YAMASAKI Takahiro

  Fujitsu Laboratories Limited

関連論文

• Investigation of Degradation model for Ultra-thin Gate Dielectrics
• Trap Generation Induced by Local Distortion in Amorphous Silicon Dioxide Film
• The Effect of Nitrogen on Thermal Diffusion in HfO_2-based Gate Dielectrics
• Hole Trapping Due to Impurities in Amorphous Silicon Dioxide
• Interface States due to Intrinsic Defects in Si(100)/SiO_2
• Trap Generation Induced by Local Distortion in Amorphous Silicon Dioxide Film

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