Interface States due to Intrinsic Defects in Si(100)/SiO_2

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概要

• 論文の詳細を見る
• 1999-09-20

著者

• Kaneta Chioko

  Fujitsu Laboratories Limited

• TERAKURA Kiyoyuki

  JRCAT-NAIR

• YAMASAKI Takahiro

  Fujitsu Laboratories Limited

• UCHIYAMA Toshihiro

  JRCAT-ATP

• UDA Tsuyoshi

  JRCAT-ATP

• Terakura Kiyoyuki

  Jrcat Central 4:national Institute Of Advanced Industrial Science And Technology Research Institute

関連論文

• Investigation of Degradation model for Ultra-thin Gate Dielectrics
• 26a-YM-3 First Principles Molecular Dynamics Simulations of Catalysis Reactions for Heterogeneous Ziegler-Natta Systems
• Trap Generation Induced by Local Distortion in Amorphous Silicon Dioxide Film
• The Effect of Nitrogen on Thermal Diffusion in HfO_2-based Gate Dielectrics
• Hole Trapping Due to Impurities in Amorphous Silicon Dioxide
• Surface Magnetic Phase Diagram of Tetragonal Manganites
• Interface States due to Intrinsic Defects in Si(100)/SiO_2
• A General Mechanism Underlying Ferromagnetism in Transition Metal Compounds
• Trap Generation Induced by Local Distortion in Amorphous Silicon Dioxide Film

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