Usui A | Aist Ibaraki
スポンサーリンク
概要
関連著者
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Usui A
Aist Ibaraki
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Usui A
Nec Corp. Ibaraki Jpn
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Usui Akira
Optoelectronics And High Frequency Device Research Laboratories Nec Corporation
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Yamaguchi A
System Devices And Fundamental Research Nec Corporation
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Sunakawa H
Nec Corp. Ibaraki Jpn
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YAMAGUCHI A.
Fundamental Research Laboratories, NEC Corporation
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Yamaguchi A.
Fundamental Research Laboratories Nec Corporation
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Kimura A
Photonic And Wireless Devices Research Laboratories Nec Corporation
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YAMAGUCHI Atsushi
Fundamental Research Laboratories, NEC Corporation
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SUNAKAWA Haruo
Opto-electronics and High Frequency Device Research Laboratories, NEC Corporation
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KIMURA Akitaka
Opto-electronics and High Frequency Device Research Laboratories, NEC Corporation
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USUI Akira
Opto-electronics and High Frequency Device Research Laboratories, NEC Corporation
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SAKAI Akira
Fundamental Research Laboratories, NEC Corporation
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USUI Akira
Fundamental Research Laboratories, NEC Corporation
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Nido M
Photonic And Wireless Devices Research Laboratories Nec Corporation
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Usui Akira
Fundamental Res. Labs. Nec Corporation
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Usui Akira
Opto-electronics And High Frequency Device Research Laboratories Nec Corporation
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Sakai Akira
Fundamental Research Laboratories Nec Corporation
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Sunakawa Haruo
Fundamental Research Laboratories
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Sunakawa Haruo
Fundamental Res. Labs. Nec Corporation
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KURAMOTO Masaru
The authors are with Optoelectronics and High Frequency Device Res. Labs., NEC Corporation
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MIZUTA Masashi
The authors are with Optoelectronics and High Frequency Device Res. Labs., NEC Corporation
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KIMURA Akitaka
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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SUNAKAWA Haruo
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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USUI Akira
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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NIDO Masaaki
Opto-electronics Research Laboratories, NEC Corporation
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Mizuta M
Photonic And Wireless Devices Research Laboratories Nec Corporation
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Kuramoto M
Photonic And Wireless Devices Research Laboratories Nec Corporation
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Kuramoto M
The Authors Are With Optoelectronics And High Frequency Device Res. Labs. Nec Corporation
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Yamaguchi A.atsushi
Fundamental Research Laboratories Nec Corporation
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Nishi K
Single Quantum Dot Project Erato Jst Tsukuba Research Consortium:system Devices And Fundamental Rese
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SAKAI Akira
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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YAMAGUCHI A.Atsushi
The author is with Fundamental Res. Labs., NEC Corporation
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USUI Akira
The authors are with Optoelectronics and High Frequency Device Res. Labs., NEC Corporation
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KOBAYASHI Kenji
Fundamental Research Laboratories, NEC Corporation
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KIMURA Shigeru
Fundamental Research Laboratories, NEC Corporation
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KURAMOTO Masaru
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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SASAOKA Chiaki
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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HISANAGA Yukihiro
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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KURODA Naotaka
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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NIDO Masaaki
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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MIZUTA Masashi
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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KIMURA Akitaka
Opt-electronics Research Laboratories, NEC Corporation
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MANAKO Takashi
Fundamental Research Laboratories, NEC Corporation
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Sasaoka C
Photonic And Wireless Devices Research Laboratories Nec Corporation
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Kuroda N
Optoelectronics And High Frequency Device Research Laboratories Nec Corporation
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OSHIMA Masato
Department of Applied Chemistry, School of Science and Engineering, Waseda University
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IGARASHI Minoru
Research and Development Department, Kawasaki Heavy Industry, Ltd.
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NISHI Kenichi
Opto-electronics Research Laboratories, NEC Corporation
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Hisanaga Yukihiro
Optoelectronics And High Frequency Device Research Laboratories Nec Corporation
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Kuroda Naotaka
Optoelectronics And High Frequency Device Research Laboratories Nec Corporation
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Tanaka M
National Institute Of Advanced Industrial And Technology
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TANAKA Masako
Research Laboratory of Resources Utilization, Tokyo Institute of Technology
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SUZUKI Hiroharu
Department of Chemical Engineering, Faculty of Engineering, Tokyo Institute of Technology
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KAKIGANO Takeaki
Research Laboratory of Resources Utilization, Tokyo Institute of Technology
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USUI Akira
Research Laboratory of Resources Utilization, Tokyo Institute of Technology
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NODA Kazumi
Department of Chemical Engineering, Faculty of Engineering, Tokyo Institute of Technology
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MORO-OKA Yoshihiko
Research Laboratory of Resources Utilization, Tokyo Institute of Technology
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Hiroharu Suzuki
Department Of Chemical Engineering Faculty Of Engineering Tokyo Institute Of Technology
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Suzuki Hiroharu
Department Of Applied Chemistry Graduate Schhol Of Science And Engineering Tokyo Institute Of Techno
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Moro-oka Yoshihiko
Research Laboratory Of Resource Utilization Tokyo Institute Of Technology
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Kakigano Takeaki
Research Laboratory Of Resources Utilization Tokyo Institute Of Technology
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Oshima Masato
Department Of Chemical Engineering Faculty Of Engineering Tokyo Institute Of Technology
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Oshima Masato
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Igarashi M
Inst. Physical And Chemical Research (riken) Saitama
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Igarashi Minoru
Research And Development Department Kawasaki Heavy Industry Ltd.
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Noda K
Kanto Gakuin Univ. Yokohama
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SAKAKI Hiroyuki
Quantum Wave Project, JRDC
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Manako Takashi
Fundamental Research Laboratories Nec Corporation
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Kuramoto Masaru
The Authors Are With Optoelectronics And High Frequency Device Res. Labs. Nec Corporation
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Usui Akira
The Authors Are With Optoelectronics And High Frequency Device Res. Labs. Nec Corporation
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Mizuta Masashi
The Authors Are With Optoelectronics And High Frequency Device Res. Labs. Nec Corporation
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AHOPELTO Jouni
Quantum Wave Project, ERATO, Research Development Corporation of Japan (JRDC)
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YAMAGUCHI A.
Quantum Wave Project, ERATO, Research Development Corporation of Japan (JRDC)
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NISHI Kenichi
Quantum Wave Project, ERATO, Research Development Corporation of Japan (JRDC)
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USUI Akira
Quantum Wave Project, ERATO, Research Development Corporation of Japan (JRDC)
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Nishi Kenichi
Opto-electronics And High-frequency Device Research Laboratories Nec Corporation
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Usui Akira
Quantum Wave Project Erato Reseach Development Corporation Of Japan (jrdc)
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Usui Akira
Research Laboratory Of Resources Utilization Tokyo Institute Of Technology
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Kimura Shigeru
Fundamental Research Laboratories Nec Corporation
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Ahopelto Jouni
Quantum Wave Project Erato Research Development Corporation Of Japan (jrdc)
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Sakaki Hiroyuki
Quantum Wave Project Erato Research Development Corporation Of Japan (jrdc)
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Mizuta Masashi
Optoelectronics And High Frequency Device Research Laboratories Nec Corporation
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Tanaka Masako
Research Laboratory Of Resources Utilization Tokyo Institute Of Technology
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Kobayashi Kenji
Fundamental Research Laboratories Nec Corporation
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Sakai Akira
Department Of Agricultural Chemistry The University Of Tokyo
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Noda Kazumi
Department Of Chemical Engineering Faculty Of Engineering Tokyo Institute Of Technology
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Suzuki Hiroharu
Department of Applied Chemistry and Department of Synthetic Chemistry, Faculty of Engineering, Nagoya University
著作論文
- InGaN MQW Lasr Diodes Grown on an n-GaN Substrate with a Backside n-Contact(Special Issue on Blue Laser Diodes and Related Devices/Technologies)
- X-Ray Rocking Curve Determination of Twist and Tilt Angles in GaN Films Grown by an Epitaxial-Lateral-Overgrowth Technique
- Room-Temperature Continuous-Wave Operation of InGaN Multi-Quantum-Well Laser Diodes Grown on an n-GaN Substrate with a Backside n-Contact
- Thick GaN Epitaxial Growth with Low Dislocation Density by Hydride Vapor Phase Epitaxy
- Surface Morphology Study for Hexagonal GaN Grown on GaAs(100) Substrates by Hydride Vapor Phase Epitaxy
- Growth of InN by Chloride-Transport Vapor Phase Epitaxy
- Single Domain Hexagonal GaN Films on GaAs (100) Vicinal Substrates Grown by Hydride Vapor Phase Epitaxy
- Formation of Novel Trinuclear Ruthenium Alkoxo Complexes and a Tetrameric Ruthenium Hydroxo Complex. Crystal Structure of 〔η^5-C_5Me_5)Ru〕_3(μ_3-O)(μ_3-O^iPr) and 〔η^5-C_5Me^5)Ru(μ_3-OH)〕_4
- Dislocation propagation in GaN films formed by epitaxial lateral overgrowth
- Anisotropic Optical Matrix Elements in Quantum Wells with Various Substrate Orientations
- Nanoscale InP Islands for Quantum Box Structures by Hydride Vapor Phase Epitaxy