PARK Jea-Gun | Advanced Semiconductor Material and Device Development Center, Hanyang University

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著作論文

Spectral Analyses on Pad Dependency of Nanotopography Impact on Oxide Chemical Mechanical Polishing : Semiconductors
The Stability of Nano Fwned Silica Particles and Its Influence on Chemical Mechanical Planarization for Interlayer Dielectrics
Effect of Nanotopography on Chemical Mechanical Polishing : Polishing Depth, Pad, Slurry and Interlayer Film Dependencies
Effect of Nanotopography on Chemical Mechanical Polishing : Polishing Depth, Pad, Slurry and Interlayer Film Dependencies
Spectral Analyses of the Impact of Nanotopography of Silicon Wafers on Oxide Chemical Mechanical Polishing : Semiconductors
Crystal Originated Particle Induced Isolation Failure in Czochralski Silicon Wafers
Advanced Czochralski Single Silicon Crystal Growth (特集:21世紀を担うバルク単結晶) -- (シリコン)

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