Measurements and Simulations of Particles in a Plasma Chemical Vapor Deposition Chamber
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-04-15
著者
-
TAKAGI Shigeyuki
Corporate Manufacturing Engineering Center Toshiba Corporation
-
Takagi Shigeyuki
Corporate Manufacuturing Engineering Center Toshiba Corporation
-
Hasegawa Isahiro
Process Engineering Group I Semiconductor Company
-
Onoue Seiji
Corporate Manufacuturing Engineering Center Toshiba Corporation
-
Onoue Seiji
Corporate Manufacturing Engineering Center Toshiba Corporation
-
NISHITANI Kazuhito
Corporate Manufacuturing Engineering Center, Toshiba Corporation
-
TERAZAWA Tatsuya
Process Engineering Group I, Semiconductor Company
-
Terazawa Tatsuya
Process Engineering Group I Semiconductor Company
-
Nishitani Kazuhito
Corporate Manufacuturing Engineering Center Toshiba Corporation
-
Nishitani Kazuhito
Corporate Manufacturing Engineering Center, Toshiba Corporation, 33, Shin-Isogo-cho, Isogo-ku, Yokohama, Kanagawa 235-0017, Japan
-
Nishitani Kazuhito
Corporate Manufacturing Engineering Center, Toshiba Corporation, 33 Shin-Isogo-cho, Isogo-ku, Yokohama, Kanagawa 235-0017, Japan
関連論文
- Multiscale Analysis of Silicon Low-Pressure Chemical Vapor Deposition
- Gap-Fill Process of Shallow Trench Isolation for 0.13 μm Technologies
- Calibration Method for High-Density-Plasma Chemical Vapor Deposition Simulation
- Topography Simulation of Reactive Ion Etching Combined with Plasma Simulation, Sheath Model, and Surface Reaction Model(Nuclear Science, Plasmas, and Electric Discharges)
- Measurements and Simulations of Particles in a Plasma Chemical Vapor Deposition Chamber
- Study on Surface Modification of Indium Tin Oxide and Resist Surfaces Using CF4/O2 Plasma for Manufacturing Organic Light-Emitting Diodes by Inkjet Printing
- Ab Initio Calculation of F Atom Desorption in Tungsten Chemical Vapor Deposition Process Using WF6 and H2
- Modeling and Simulation of Arsenic-Doped-Silicon Low-Pressure Chemical Vapor Deposition
- Measurements and Simulations of Particles in a Plasma Chemical Vapor Deposition Chamber