Relationship between Diffusion and Adhesion Properties of Ferroelectric Thin-Film Structure on Releasable Substrate (Special Issue : Microprocesses and Nanotechnology)
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Itoh Toshihiro
Research Center For Advanced Science And Technology (rcast) The University Of Tokyo
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Suga Tadatomo
Faculty of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Honda Fumiaki
Faculty of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Hosono Toshifumi
Faculty of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Fujino Masahisa
Faculty of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Ichiki Masaaki
Research Center for Ubiquitous MEMS and Micro Engineering, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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- Relationship between Diffusion and Adhesion Properties of Ferroelectric Thin-Film Structure on Releasable Substrate (Special Issue : Microprocesses and Nanotechnology)