Large-Area Growth of In-Plane Oriented ($11\bar{2}0$) ZnO Films by Linear Cathode Magnetron Sputtering

概要

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($11\bar{2}0$) textured ZnO films are good candidates for shear-mode piezoelectric devices. In the previous deposition techniques of these films, there have been two problems related to their practical application. These problems are as follows: (i) highly oriented films can be obtained only in a small area and (ii) the crystallite $c$-axis of in the films is radially oriented in the substrate plane. To resolve these problems, the sputtering deposition technique using a linear cathode has been proposed. The in-plane and out-of-plane orientations of the films were quantitatively determined by pole figure analysis. As a result, we have demonstrated the formation of in-plane unidirectionally oriented ($11\bar{2}0$) ZnO films over the entire area of 4-in. silicon wafers.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2010-07-25