Ga-Doped ZnO/GaN Schottky Barrier UV Band-Pass Photodetector with a Low-Temperature-Grown GaN Cap Layer
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概要
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Ga-doped ZnO (GZO) films were deposited onto low-temperature-grown (LTG) GaN/i-GaN (PD-I) and i-GaN (PD-II) epitaxy layers to form Schottky barrier UV band-pass photodetectors (PDs). The UV PDs exhibited a narrow band-pass spectral response ranging from 330 to 380 nm. It was also found that by using an LTG GaN layer on top of conventional nitride-based UV PDs, the leakage current was significantly reduced and a much larger photocurrent-to-dark-current contrast ratio was achieved. The short-wavelength cutoff at around 330 nm can be attributed to the marked absorption of the GZO top contact layer. The zero-bias peak responsivities were estimated to be 0.13 and 0.08 A/W at 360 nm for PD-I and PD-II, respectively. When the reverse bias was below $-10$ V, the dark current of PD-I was considerably below 20 pA.
- 2010-04-25
著者
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Sheu Jinn-kong
Institute Of Electro-optical Science And Engineering And Advanced Optoelectronic Technology Center N
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Kuo-Hua Chang
Institute of Electro-Optical Science and Engineering, Advanced Optoelectronic Technology Center and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan
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Chang Kuo-Hua
Institute of Electro-Optical Science and Engineering, Advanced Optoelectronic Technology Center and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan
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Lee Ming-Lun
Department of Electro-Optical Engineering, Southern Taiwan University, Tainan 71005, Taiwan
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Kai-Shun Kang
Institute of Electro-Optical Science and Engineering, Advanced Optoelectronic Technology Center and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan
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Jing-Fong Huang
Institute of Electro-Optical Science and Engineering, Advanced Optoelectronic Technology Center and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan
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Wei-Li Wang
Institute of Electro-Optical Science and Engineering, Advanced Optoelectronic Technology Center and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan
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Wei-Chih Lai
Institute of Electro-Optical Science and Engineering, Advanced Optoelectronic Technology Center and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan
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Sheu Jinn-Kong
Institute of Electro-Optical Science and Engineering and Advanced Optoelectronic Technology Center and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, Taiwan 701, Republic of China
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Jinn-Kong Sheu
Institute of Electro-Optical Science and Engineering, Advanced Optoelectronic Technology Center and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan
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Ming-Lun Lee
Department of Electro-Optical Engineering, Southern Taiwan University, Tainan 71005, Taiwan
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Lee Ming-Lun
Department of Electro-Optical Engineering, Southern Taiwan University of Technology, Tainan county 710, Taiwan
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