Relationship between Resistivity and Structure of Photosensitive Organic Silsesquioxanes by Impedance Spectroscopy and Solid-State 29Si Nuclear Magnetic Resonance
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概要
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Novel photosensitive insulating materials comprising of organic silsesquioxane (OSQ) have been developed. The OSQ had the high photosensitivity, insulating performance, transparency, and heat resistance required for a passivation layer of semiconductors in thin-film-transistor liquid crystal displays (TFT-LCDs). A passivation layer is needed for high resistivity to ensure the electrical stability of TFT-LCDs. We analyzed the electrical properties and local structures by impedance spectroscopy and solid-state 29Si nuclear magnetic resonance (NMR). The impedance Cole–Cole plots and frequency-dependent dielectric constants ($\varepsilon'$) at 20 and 60 °C were obtained by impedance spectroscopy of Al/OSQ/Al multilayer substrates. Cross polarization/magic angle spinning (CP/MAS) 29Si NMR analyses of OSQ samples showed that the condensation reaction did not occur by UV irradiation. The condensation occurred during baking processes above 150 °C. The NMR analyses also showed the behaviors of various ionic migration species detected by impedance spectroscopy.
- 2008-02-25
著者
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Kaji Hironori
Institute For Chemical Research Kyoto University
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Naito Hiroyoshi
Department Of Chemistry And Organosilicon Research Laboratory
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Matsukawa Kimihiro
Osaka Municipal Technical Res. Inst. Osaka Jpn
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Watanabe Naoki
Department Of Applied Physics Faculty Of Engineering Tohoku University
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Matsukawa Kimihiro
Osaka Municipal Technical Research Institute, Osaka 536-8553, Japan
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Nakatani Yasuhiro
Research and Development Institute, Sekisui Chemical Co., Ltd., Shimamoto, Osaka 618-8589, Japan
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Kaji Hironori
Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan
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Kusaka Yasunari
Research and Development Institute, Sekisui Chemical Co., Ltd., Shimamoto, Osaka 618-8589, Japan
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Nakamura Shigeru
Research and Development Institute, Sekisui Chemical Co., Ltd., Shimamoto, Osaka 618-8589, Japan
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Azuma Kenichi
Research and Development Institute, Sekisui Chemical Co., Ltd., Shimamoto, Osaka 618-8589, Japan
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Sasaki Taku
Research and Development Institute, Sekisui Chemical Co., Ltd., Shimamoto, Osaka 618-8589, Japan
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Unate Takao
Research and Development Institute, Sekisui Chemical Co., Ltd., Shimamoto, Osaka 618-8589, Japan
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Nakasuga Akira
Research and Development Institute, Sekisui Chemical Co., Ltd., Shimamoto, Osaka 618-8589, Japan
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Watanabe Naoki
Department of Physics and Electronics, Osaka Prefecture University, Sakai 599-8531, Japan
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NAITO Hiroyoshi
Department of Anatomy, Tokyo Dental College
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