Micrometer-Scale Local-Oxidation Lithography Using Scanning Probe Microscopy
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概要
- 論文の詳細を見る
We have studied micrometer-scale scanning probe microscopy (SPM) local-oxidation lithography on Si. In order to perform large-scale oxidation, an SPM tip with a contact area of $2.5 \times 1.9$ μm2, which is about 12,000 times larger than that of a conventional SPM tip, was prepared. The width of the Si oxide produced was clearly determined by the contact length of the tip. Furthermore, the throughput reached 125 μm2/s, which is 10,000 times larger than that of conventional SPM local oxidation. The SPM tip with a larger contact area may increase the spatial dimension of the water meniscus, resulting in a larger oxidized area. It is suggested from our results that SPM local oxidation can be upscaled by using a larger tip radius.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-01-25
著者
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Nishimura Shinya
Department Of Anesthesiology Osaka General Medical Center
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Shirakashi Jun-ichi
Department of Electrical and Electronic Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan
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Ogino Takumi
Department of Electrical and Electronic Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan
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