Scratch Nanolithography on Si Surface Using Scanning Probe Microscopy: Influence of Scanning Parameters on Groove Size
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概要
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Scanning probe microscope (SPM) scratching with a diamond-coated tip on a Si surface was performed in a low-force regime of less than 9 μN. The influence of various scan parameters on the groove size was investigated. The groove size could be precisely controlled by the applied force, scan direction, and the number of scan cycles. There is no effect of the scan speed on the groove size. It is concluded that high-speed nanolithography can be achieved without the degradation of patterns by SPM scratching. Using this method, more complex nanostructures such as a line and space pattern with a pitch of 30 nm and a dot array of $2.6 \times 10^{10}$ cm-2 density were successfully fabricated on a Si surface.
- 2008-01-25
著者
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Nishimura Shinya
Department Of Anesthesiology Osaka General Medical Center
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Shirakashi Jun-ichi
Department of Electrical and Electronic Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan
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Ogino Takumi
Department of Electrical and Electronic Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan
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