Sub-20 nm Scratch Nanolithography for Si Using Scanning Probe Microscopy
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概要
- 論文の詳細を見る
Scratching using a scanning probe microscope (SPM) with a diamond-coated tip was performed on Si(100). The groove size increased linearly with the applied force. By adjusting the applied force, we successfully fabricated a groove with a width of 11 nm and a depth of 0.58 nm at 1 μN. The structural properties of the grooves were evaluated using statistical parameters. The standard deviation (STD) of the groove size increased with increasing the applied force. However, the relative STD (RSD), defined as the STD divided by the mean value, was approximately 10% without depending on the applied force. These results imply that the size fluctuation of grooves can be controlled by the applied force of the tip and that it is possible to perform sub-20 nm nanolithography on Si using SPM scratching.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-10-15
著者
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Nishimura Shinya
Department Of Anesthesiology Osaka General Medical Center
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Shirakashi Jun-ichi
Department of Electrical and Electronic Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan
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Nishimura Shinya
Department of Electrical and Electronic Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan
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Ogino Takumi
Department of Electrical and Electronic Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan
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