Fabrication of Low Resistivity Nb-doped TiO2 Transparent Conductive Polycrystalline Films on Glass by Reactive Sputtering

概要

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Nb-doped anatase TiO2 (TNO) polycrystalline films with excellent conductivity and transparency were successfully fabricated by reactive sputtering combined with post annealing in H2 gas. The H2 annealing of as-deposited amorphous films caused an abrupt decrease in resistivity ($\rho$), which was accompanied by crystallization into the anatase structure. A film deposited on an unheated glass substrate with subsequent H2 annealing at 600 °C exhibited a resistivity of $9.5\times 10^{-4}$ $\Omega$ cm and an average optical transmittance of ${\sim}75$% in the visible region. This $\rho$ value is of the same order as that of epitaxial TNO films, which indicates that sputtering is a promising technique for obtaining large-area TNO films.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2007-08-15