Aligning Capabilities of a Nematic Liquid Crystal on Treated SiOx Thin-Film Layers by Electron Beam Evaporation
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概要
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We studied liquid crystal (LC) aligning capabilities on a treated SiOx thin-film surface by 45° evaporation with an electron beam system. A uniform vertical LC alignment on SiOx thin-film surfaces was achieved. A high pretilt angle of about 86.5° was obtained. A good LC alignment on treated SiOx thin-film layers by 45° evaporation with electron beam was also observed at an annealing temperature of 250 °C. The high pretilt angle and the good thermal stability of LC alignment on SiOx thin-films by 45° obliqued electron beam evaporation can be achieved.
- 2006-09-15
著者
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Kim Young-hwan
Department Of Electrical And Electronic Engineering Yonsei University
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Seo Dae-shik
Department Of Electrical & Computer Engineering College Of Engineering Yonsei University
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Kang Hyung-ku
Department Of Electrical And Electronic Engineering Yonsei University
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Kang Soo-hee
Department Of Electrical And Electronic Engineering Yonsei University
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Kim Jong-hwan
Department Of Electrical And Electronic Engineering College Of Engineering Yonsei University
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Hwang Jeoung-yeon
Department Of Electrical & Computer Engineering College Of Engineering Yonsei University
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Han Jin-Woo
Department of Electrical and Electronic Engineering (C-724), College of Engineering, Yonsei University, 134 Shinchon-dong, Seodaemoon-ku, Seoul 120-749, Korea
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Kim Young-Hwan
Department of Electrical and Electronic Engineering, Yonsei University, Seoul 120-749, Korea
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Kang Hyung-Ku
Department of Electrical and Electronic Engineering, Yonsei University, Seoul 120-749, Korea
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Seo Dae-Shik
Department of Electrical and Electronic Engineering, Yonsei University, Seoul 120-749, Korea
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Kang Soo-Hee
Department of Electrical and Electronic Engineering, Yonsei University, Seoul 120-749, Korea
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Kim Jong-Hwan
Department of Electrical and Electronic Engineering, Yonsei University, Seoul 120-749, Korea
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Kim Jong-Hwan
Department of Electrical & Electronic Engineering, College of Engineering, Yonsei University, 134 Shinchon-dong, Seodaemoon-ku, Seoul 120-749, Korea
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