Electrical Properties of La0.7Ca0.3MnO3 Thin Films Obtained by Metal-Organic Deposition (MOD) using Excimer Laser and Thermal Annealing
スポンサーリンク
概要
- 論文の詳細を見る
Epitaxial La0.7Ca0.3MnO3 (LCMO) thin films were prepared by thermal and excimer laser (EL) metal-organic deposition (MOD). Using simple thermal annealing (STA) at 800–1000°C, the LCMO films were well epitaxially grown on single-crystalline SrTiO3 substrates. When, using a KrF or an ArF excimer laser irradiation, the LCMO films were also epitaxially grown at a substrate temperature of 500°C. The films produced by STA exhibited metal–insulator transition temperatures $T_{\text{p}}$’s ranging from 282 to 290 K while those obtained by EL irradiation had a $T_{\text{p}}$ of approximately 205 K. For bolometric applications, the temperature coefficient of resistance (TCR) of the films was calculated. The LCMO films obtained by STA have a $\mathrm{TCR}$ of 8.5%/K at 228 K. On the other hand, using the EL irradiation, the $\mathrm{TCR}$ values are 5.8%/K at 165 K and 6.5%/K at 128 K for the KrF and ArF excimer lasers, respectively.
- 2005-07-15
著者
-
MANABE Takaaki
National Institute of Advanced Industrial Science and Technology
-
DAOUDI Kais
National Institute of Advanced Industrial Science and Technology (AIST)
-
YAMAGUCHI Iwao
National Institute of Advanced Industrial Science and Technology (AIST)
-
MIZUTA Susumu
National Institute of Advance Industrial Science and Technology (AIST)
-
Tsuchiya Tetsuo
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
-
Kumagai Toshiya
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
-
Mizuta Susumu
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
-
Tsuchiya Tetsuo
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
-
Manabe Takaaki
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
-
Kumagai Toshiya
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
-
Manabe Takaaki
National Institute of Advance Industrial Science and Technology (AIST)
-
Kumagai Toshiya
National Chemical Laboratory for Industry
-
Mizuta Susumu
National Chemical Laboratory for Industry
関連論文
- Synthesis and Surface Acoustic Wave Property of Aluminum Nitride Thin Films Fabricated on Silicon and Diamond Substrates Using the Sputtering Method : Surfaces, Interfaces, and Films
- Preparation of polycrystalline VO2 films on glass and TiO2/glass substrates by means of excimer laser assisted metal organic deposition
- Epitaxial growth of La_Ba_MnO_3 thin films on SrTiO_3 and LaAlO_3 substrates by metal-organic deposition process
- Preparation of Double-Sided YBCO Films on LaAlO_3 by MOD Using Commercially Available Coating Solution( Superconducting High-frequency Devices)
- Fabrication of Double-Sided YBa_2Cu_3O_7 Films on CeO_2-Buffered Sapphire Substrates by MOD Process( Superconducting High-frequency Devices)
- Electrical Properties of La_Ca_MnO_3 Thin Films Obtained by Metal-Organic Deposition (MOD) using Excimer Laser and Thermal Annealing
- Preparation of High-J_c YBa_2 Cu_3O_ Films on CeO_2-Buffered Yttria-Stabilized Zirconia Substrates by Fluorine-Free Metalorganic Deposition
- Large Temperature Coefficient of Resistance in La_Ca_MnO_3 Thin Films Obtained by Metal Organic Deposition Process
- Low Temperature Growth of Epitaxial La_Sr_MnO_3 Thin Films by an Excimer-Laser-Assisted Coating Pyrolysis Process
- Preparation of Epitaxial YBa_2Cu_3O_/CeO_2 Multilayer Films on Yttria-stabilized Zirconia (100) by All-Coating-Pyrolysis Process : Superconductors
- Preparation of PbTiO_3 Thin Films Using a Coating Photolysis Process with ArF Excimer Laser
- X-Ray Diffraction Studies of Epitaxial La_Sr_CoO_3 Thin Films Prepared by the Dipping-Pyrolysis Process
- Direct Conversion of Metal Acetylacetonates and Metal Organic Acid Salts into Metal Oxides Thin Films Using Coating Photolysis Process with An ArF Excimer Laser
- Direct Conversion of Titanium Alkoxide into Crystallized TiO_2 (rutile) Using Coating Photolysis Process with ArF Excimer Laser
- Epitaxial Growth of Bi_4Ti_3O_ Thin Films on LaAlO_3 (012) and MgO (100) by Dipping-Pyrolysis Process
- Preparation of Epitaxial Pb(Zr, Ti)O_3 Thin Films on Nb-Doped SrTiO_3(100) Substrates by Dipping-Pyrolysis Process
- Critical Current Densities at 77 K in Ba_2YCu_3O_-Ag Films Prepared by Dipping-Pyrolysis Process
- Preparation and Superconducting Properties of Bi-Pb-Sr-Ca-Cu-O Films (T_c=106 K) by the Dipping-Pyrolysis Process
- Preparation of High-J_c Ba_2YCu_3O_ Films on SrTiO_3 (100) Substrates by the Dipping-Pyrolysis Process at 750℃
- Preparation of Superconducting Ba_2YCu_3O_/Ag Composite Films by the Dipping-Pyrolysis Process Using Metal Naphthenates at 750℃
- Crystal Sructure of Zirconium Oxide Deposited as Thin Films from Zr-acetylacetonate and Zr-ter-butoxide by Laser Chemical Vapor Deposition Technique
- Crystal Structures of the TiO_2 Films on the Quartz Substrate and the Powder formed in the Gaseous Phase by ArF Laser Photolysis of Ti(O-i-C_3H_7)_4
- Effects of Annealing Conditions and Substrate Materials on the Superconducting Properties of Ba_2YCu_3O_ Films Prepared by the Dipping-Pyrolysis Process at 750℃
- Preparation of Superconducting Ba_2YCu_3O_ Films by the Dipping-Pyrolysis Process at 700° and 750℃
- Effects of Heat Treatment Conditions on the Critical Current Densities of Ba_2YCu_3O_ Films Prepared by the Dipping-Pyrolysis Process
- Effect of Ion Implantations and Post-treatments on Optical Transmission of Fluorozirconate Glass
- Polarization Properties in Phase Conjugation with Bacteriorhodopsin
- Optical Characterization of Ion-Implanted Glass Surface Layers with Surface Plasmon Resonance Method
- Fusion of Paramecia by Means of Altered Electrofusion
- Adjustment of thermal hysteresis in epitaxial VO2 films by doping metal ions
- Ti-Doped VO2 Films Grown on Glass Substrates by Excimer-Laser-Assisted Metal Organic Deposition Process
- Preparation of YBa2Cu3O7-δ Micropatterns Using Metal–Organic Deposition with Electron Beam
- Epitaxial Growth of La0.7Ba0.3MnO3 Thin Films on SrTiO3 and LaAlO3 Substrates by Metal-Organic Deposition
- Electrical Properties of La0.7Ca0.3MnO3 Thin Films Obtained by Metal-Organic Deposition (MOD) using Excimer Laser and Thermal Annealing
- Preparation and Characterization of Epitaxial VO2 Films on Sapphire Using Postepitaxial Topotaxy Route via Epitaxial V2O3 Films
- Low-Temperature Fabrication of Red Phosphor Ca0.997Pr0.002TiO3 Thin Film Using Excimer Laser Assisted Metal Organic Deposition
- Preparation of High-$J_{\text{c}}$ YBa2Cu3O7-y Films on CeO2-Buffered Yttria-Stabilized Zirconia Substrates by Fluorine-Free Metalorganic Deposition
- Kinetics of the catalytic decomposition of hydrogen iodide in the magnesium-iodine thermochemical cycle.