Preparation of High-$J_{\text{c}}$ YBa2Cu3O7-y Films on CeO2-Buffered Yttria-Stabilized Zirconia Substrates by Fluorine-Free Metalorganic Deposition
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概要
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Epitaxial YBa2Cu3O7-y (YBCO) films have successfully been prepared by fluorine-free metalorganic deposition on yttria-stabilized zirconia (YSZ) substrates with an evaporated CeO2 buffer layer. The YBCO films, prepared using a metal acetylacetonate-based coating solution, were highly (001)-oriented by X-ray diffraction $\theta$–$2\theta$ scanning and $\phi$ scanning. The 0.21-μm-thick YBCO film demonstrated a high superconducting transition temperature, $T_{\text{c}}=90.1$ K, and high critical current densities with an average in excess of 4 MA/cm2 at 77 K using an inductive method. Transport critical current ($I_{\text{c}}$) was also measured by a standard four-terminal technique; the $I_{\text{c}}$ value reached 185 A in a 2.5-cm-wide current path formed on a 5-cm-diameter film. These excellent properties are attributed to the small in-plane fluctuation due to high epitaxy of the YBCO films, which resulted from good matching of the crystal structure, lattice parameter and thermal expansion coefficient among the YBCO film, CeO2 buffer layer and YSZ substrate, as well as from the smooth and uniform surface morphology, i.e., average roughness = 0.34 nm, of the CeO2 buffer layer. The present deposition conditions, i.e., 700°C and $ p(\text{O$_{2}$})=4\times 10^{-2}$ Pa, activated by radio frequency plasma at 20 W, are valid for the growth of such CeO2(100) buffer layers on YSZ substrates.
- 2005-07-15
著者
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YAMAGUCHI Iwao
National Institute of Advanced Industrial Science and Technology (AIST)
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KONDO Wakichi
National Institute of Advance Industrial Science and Technology (AIST)
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TSUKADA Kenichi
National Institute of Advanced Industrial Science and Technology (AIST)
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Kumagai Toshiya
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Sohma Mitsugu
National Chemical Laboratory For Industry
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Furuse Mitsuho
National Institute Of Advanced Industrial Science And Technology
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Fuchino Shuichiro
National Institute Of Advanced Industrial Science And Technology
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Manabe Takaaki
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
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Yamaguchi Iwao
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
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Kumagai Toshiya
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
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Manabe Takaaki
National Institute of Advance Industrial Science and Technology (AIST)
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Sohma Mitsugu
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
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Kumagai Toshiya
National Chemical Laboratory for Industry
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Kondo Wakichi
National Chemical Laboratory for Industry
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Kondo Wakichi
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
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