A New Spectral Imaging Ellipsometer for Measuring the Thickness of Patterned Thin Films
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概要
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We proposed spectral imaging ellipsometry that uniquely combines one-dimensional imaging and spectroscopic ellipsometry. This type of ellipsometry enables the measurement of the optical parameters and dimensional structures of patterned or multilayered thin films. We demonstrated the result of the measurement of the thickness of patterned SiO2 layers with 3 nm accuracy and 200 μm spatial resolution.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2004-09-15
著者
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Lee Yun
Division of Electronics and Information Technology
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CHO Yong
Division of Applied Science, Korea Institute of Science and Technology
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Cho Hyun
Department Of Biology Sunchon National University
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Kim Hyun
Division Of Ceramics Korea Institute Of Science And Technology
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Chegal Won
Division Of Optical Metrology Korea Research Institute Of Standards And Science
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Kim Soo
Department Of Advanced Technology Fusion Konkuk University
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Lee Yun
Division of Optical Metrology, Korea Research Institute of Standards and Science, Daejeon 305-600, South Korea
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Cho Yong
Division of Optical Metrology, Korea Research Institute of Standards and Science, Daejeon 305-600, South Korea
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Kim Soo
Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701, South Korea
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Chegal Won
Division of Optical Metrology, Korea Research Institute of Standards and Science, Daejeon 305-600, South Korea
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CHO Hyun
Department of Anesthesiology and Pain Medicine, Samsung Seoul Hospital, Samsung Medical Center, Sungkyunkwan University School of Medicine
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