Leveling Viscous Fluids Using Ultrasonic Waves
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概要
- 論文の詳細を見る
In this paper, we propose a method for leveling viscous fluids—photoresist, for example—on substrates using ultrasound. We expect this technology to supersede the spin-coat method, particularly for large substrates. Ultrasonic leveling using standing waves is presented first, followed by a leveling method using traveling waves. The uneven thickness distribution produced through slit nozzle application can be eliminated using the proposed method. The experimental evaluation of these methods was performed, and the results demonstrate the positive effect on the surface nonflatness of a photoresist. In particular, the traveling wave method has an advantage of the freedom of orientation of the slit nozzle movement.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-05-15
著者
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Ueha Sadayuki
Precision And Intelligence Lab. Tokyo Inst. Of Technol.
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Nakamura Kentaro
Precision And Intelligence Lab. Tokyo Inst. Of Technol.
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Ueha Sadayuki
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsutacho, Midori-ku, Yokohama 226-8503, Japan
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Ampo Keisuke
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsutacho, Midori-ku, Yokohama 226-8503, Japan
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Tanaka Shinobu
Tokyo Electron Limited, TBS Broadcast Center, 3-6 Akasaka 5-chome, Minato-ku, Tokyo 107-8481, Japan
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Nakamura Kentaro
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsutacho, Midori-ku, Yokohama 226-8503, Japan
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