Magnetron-sputtered Hydrogenated Carbon Nitride: Structural and Optical Properties of As-deposited and Postannealed Films

概要

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Amorphous C:H:N thin films were deposited on n-Si and SiO2 substrates at 673 K by RF magnetron sputtering using pure graphite (99.999%) as a target material and mixtures of Ar, N2 and H2 for plasma generation. The dependence of structural and optical properties on nitrogen content was investigated using X-ray photoemission spectroscopy (XPS), Fourier transform infrared spectroscopy (FT-IR) spectroscopy, UV-visible absorption spectroscopy and ellipsometry. Typical stretching modes connected with carbon nitride and diamond-like carbon could be seen in FT-IR spectra. Ellipsometry studies revealed that the optical constants of refractive index ($n$) and extinction coefficient ($k$) increased with an increase in nitrogen content. The undesired increase in $k$ value due to increased nitrogen content is attributed to the formation of sp2CN bonds observed by XPS and FT-IR. Optimum conditions for producing transparent films with good values of $n$ and $k$ were determined. The films were subjected to thermal annealing at 873 K and 1073 K in vacuum (${\leq}1\times 10^{-5}$ Pa), and postannealing studies were carried out. Annealing caused breakage of undesired sp2CN bonds, which in turn enforced a good effect on the optical property of the films by increasing their optical transmittance.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2003-11-15