Single Electron Transistor Fabricated on Heavily Doped Silicon-on-Insulator Substrate
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概要
- 論文の詳細を見る
Experiments on side-gated silicon single electron transistors (SET) fabricated on a heavily doped thin silicon-on-insulator substrate are reported. Some of the devices showed single-island-like and some multi-island-like behaviour, but the properties of individual samples changed with time. Single-electron gate modulation was observable up to $T=100$ K, at least. A slow response of SET current to a large change in gate voltage was observed, but the process speeded up under illumination.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-03-30
著者
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Forchel Alfred
Technische Physik Universitat Wurzburg
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Kamp Martin
Technische Physik Universitat Wurzburg Am Hubland
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Savin Alexander
Department of Physics, University of Jyväskylä, P.O. Box 35, FIN-40351 Jyväskylä, Finland
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Forchel Alfred
Technische Physik, Universität Würzburg, Am Hubland, D-97074 Würzburg, Germany
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Manninen Antti
Department of Physics, University of Jyväskylä, P.O. Box 35, FIN-40351 Jyväskylä, Finland
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Kamp Martin
Technische Physik, Universität Würzburg, Am Hubland, D-97074 Würzburg, Germany
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Ahopelto Jouni
VTT Microelectronics Centre, P.O. Box 1101, FIN-02044 VTT, Finland
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Ahopelto Jouni
VTT Micro and Nanoelectronics, Espoo, FI-02044, Finland
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Pekola Jukka
Department of Physics, University of Jyväskylä, P.O. Box 35, FIN-40351 Jyväskylä, Finland
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Kauranen Jari
Department of Physics, University of Jyväskylä, P.O. Box 35, FIN-40351 Jyväskylä, Finland
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Emmerling Monika
Technische Physik, Universität Würzburg, Am Hubland, D-97074 Würzburg, Germany
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Prunnila Mika
VTT Microelectronics Centre, P.O. Box 1101, FIN-02044 VTT, Finland
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Kauranen Jari
Department of Physics, University of Jyväskylä, P.O. Box 35, FIN-40351 Jyväskylä, Finland
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Emmerling Monika
Technische Physik, Universität Würzburg, Am Hubland, D-97074 Würzburg, Germany
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