Relationship between control of reactive plasmas with magnetic filter and formation of thin films
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概要
- 論文の詳細を見る
Plasma parameters (CH_4/H_2+Ar plasmas) are spatially well controlled using a movable magnetic filter. At any filter position, plasma parameters change dramatically across the magnetic filter. The plasma is divided into two parts, the source plasma region (high density plasmas with energetic electrons) and the diffused plasma region (low electron-temperature plasmas without energetic electrons). Carbon thin films are prepared well in the diffused plasma region. The effects of bias potential of the substrate and control of neutral radicals on formation of thin films are discussed briefly.
- 応用物理学会の論文
- 1997-07-30
著者
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TAUCHI Yasushi
Department of Electrical and Electronic Engineering, Yamaguchi University
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Fukumasa Osamu
Department Of Electrical And Electronic Engineering Faculty Of Engineering
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Sakiyama Satoshi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Yamaguchi University
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Sakiyama Satoshi
Department of Electrical and Electronic Engineering, Yamaguchi University,
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Tauchi Yasushi
Department of Electrical and Electronic Engineering, Yamaguchi University,
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