Pressure dependence of negative hydrogen ion production in a cesium seeded tandem volume source
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概要
- 論文の詳細を見る
Effects of cesium vapor injection on H^- production in a tandem volume source are studied numerically as a function of plasma parameters. Model calculation is performed by solving a set of particle balance equations for steady-state hydrogen discharge plasmas. Here, the results with a focus on gas pressure and electron temperature dependences of H^- volume production are presented and discussed. Considering H^- surface production caused by both H atoms and positive hydrogen ions, enhancement of H^- production and pressure dependence of H^- production observed experimentally are qualitatively well reproduced in the model. For enhancement of H^- production, however, so-called electron cooling is not very effective if plasma parameters are initially optimized with the use of a magnetic filter.
- 社団法人応用物理学会の論文
- 1996-11-15
著者
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Fukumasa Osamu
Department Of Electrical And Electronic Engineering Faculty Of Engineering
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NIITANI Eiji
Department of Electrical and Electronic Engineering, Faculty of Engineering
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Niitani E
Yamaguchi Univ. Ube Jpn
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