A Beamline and Its Components for SR Lithography
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概要
- 論文の詳細を見る
An efficient beamline for synchrotron radiation (SR) lithography has been built for the synchrotron radiation facility at NTT's Atsugi R & D Center. The relationship between the reflectivity and the surface roughness of the platinum-coated X-ray mirror, one of the key components of the beamline, is measured. The results confirm that it is necessary for the grazing angle of the mirror to be smaller than 2°. A beamline consisting of two X-ray mirror optics and two X-ray windows is proposed for exposure in an atmospheric environment. The optimum mirror optics for converging and collimating the X-ray beam are investigated using a ray-tracing technique, and their feasibility is experimentally confirmed.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1989-10-20
著者
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YOSHIHARA Hideo
NTT LSI Laboratories
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KANEKO Takashi
NTT LSI Laboratories
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KITAYAMA Toyoki
NTT LSI Laboratories
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Saitoh Yasunao
NTT LSI Laboratories, 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-01
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Itabashi Seiichi
NTT LSI Laboratories, 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-01
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