Mirror Design and Alignment for X-Ray Lithography Beamlines

概要

論文の詳細を見る
In order to improve the performance of X-ray lithography beamlines with a two toroidal mirror system, we have developed a simple yet efficient mirror design tool and a convenient alignment technique. A ray-tracing design tool named X-BEAM (X-ray beamline evaluation and arrange module) calculates a small number of rays and automatically optimizes mirror specifications in a short time. Optimization of mirror specifications proceeds by minimizing an evaluation function of power intensity uniformity and runout errors. A procedure to align mirrors using X-BEAM is also proposed. A plate which has three pinholes is inserted into the X-ray flux just in front of the first mirror. The mirror posture is uniquely determined by measuring pinhole image configuration on screens located downstream of mirrors and by deriving manipulating parameters from X-BEAM calculation. Using these design and alignment techniques, we have achieved a highly efficient beamline using a two toroidal mirror system for X-ray lithography.
社団法人応用物理学会の論文
1995-12-30