X-Ray Projection Lithography Using a Fresnel Zone Plate

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In this article, we experimentally confirm the possibility of X-ray projection using a Fresnel zone plate (FZP) and monochromatic synchrotron radiation (SR) light at a wavelength of 10 Å by pattern replication. To evaluate the characteristics and patterning ability of the FZP, we designed one with a 4000-Å Ta absorber on a 0.2-μm SiN membrane with a 0.159-μm outermost zone width for 0.2-μm resolution. Using the designed linear and circular FZPs, the focusing image of the X-ray source we obtained was almost equal to that predicted theoretically. We used FZP projection optics to obtain single-layer resist patterns as projection images. Moreover, using a penetrating mask, which is the conventional transmission type, We successfully replicated 0.2-μm line and space and a mesh with a reduction ratio of 1/2.
社団法人応用物理学会の論文
1995-12-30