A Beamline and Its Components for SR Lithography : Lithography Technology
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-12-30
著者
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YOSHIHARA Hideo
NTT LSI Laboratories
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Saitoh Yasunao
Ntt Lsi Laboratorise
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KANEKO Takashi
NTT LSI Laboratories
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KITAYAMA Toyoki
NTT LSI Laboratories
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Yoshihara Hideo
Ntt Lsi Laboratorise
-
ITABASHI Seiichi
NTT LSI Laboratorise
-
Kitayama Toyoki
Ntt Lsi Laboratorise
-
Kaneko Takashi
Ntt Lsi Laboratorise
-
Saitoh Yasunao
NTT LSI Laboratories, 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-01
-
Itabashi Seiichi
NTT LSI Laboratories, 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-01
関連論文
- Simulation of X-Ray Mask Distortion
- Ta Film Properties for X-Ray Mask Absorbers
- Ta/SiN-Stucture X-Ray Masks for Sub-Half-Micron LSIs : Lithography Technology
- High-Precision X-Ray Mask Technology : Lithography Technology
- Synchrotron Radiation Lithography for DFB Laser Gratings : Lithography Technology
- Photon Stimulated Desorption of CO from Si Single Crystal
- A Si Single-Crystal Shield-Pipe for Precise Measurement of Synchrotron Radiation Induced Gas Desorption
- SOR Lithography : Lithography Technology
- Mirror Design and Alignment for X-Ray Lithography Beamlines
- High-Precision X-Ray Mask Technology
- A Beamline and Its Components for SR Lithography : Lithography Technology
- Elimination of Spherical Aberration in Grazing-Incidence Optics with Cylindrical Mirrors
- Ta/SiN-Structure X-Ray Masks for Sub-Half-Micron LSIs
- A Beamline and Its Components for SR Lithography
- Synchrotron Radiation Lithography for DFB Laser Gratings