SOR Lithography : Lithography Technology
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-12-30
著者
-
YOSHIHARA Hideo
NTT LSI Laboratories
-
Ishihara Sunao
Ntt Lsi Laboratories
-
HOSOKAWA Terno
NTT LSI Laboratories
-
HAYASAKA Toa
NTT LSI Laboratories
-
KITAYAMA Toyoki
NTT LSI Laboratories
関連論文
- Simulation of X-Ray Mask Distortion
- Ta Film Properties for X-Ray Mask Absorbers
- Ta/SiN-Stucture X-Ray Masks for Sub-Half-Micron LSIs : Lithography Technology
- High-Precision X-Ray Mask Technology : Lithography Technology
- Synchrotron Radiation Lithography for DFB Laser Gratings : Lithography Technology
- Overlay Repeatability in Mix-and-Match Exposure Using the SR Stepper: SS-1
- Photon Stimulated Desorption of CO from Si Single Crystal
- A Si Single-Crystal Shield-Pipe for Precise Measurement of Synchrotron Radiation Induced Gas Desorption
- SOR Lithography : Lithography Technology
- High-Precision X-Ray Mask Technology
- A Beamline and Its Components for SR Lithography : Lithography Technology
- Ta/SiN-Structure X-Ray Masks for Sub-Half-Micron LSIs
- A Beamline and Its Components for SR Lithography
- Synchrotron Radiation Lithography for DFB Laser Gratings