Concentration Study of Deep-Level Cu Center in Cu-Diffused Si Crystals by Deep-Level Transient Spectroscopy and Photoluminescence Measurements
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概要
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The concentration of the Cu center, located at $E_{\text{v}} + 0.1$ eV ($E_{\text{v}}$: top energy of the valence band) in p-type silicon crystals diffused with Cu of various concentrations at 700°C, was measured by deep-level transient spectroscopy (DLTS). The DLTS concentration of the center was almost linearly dependent on the concentration of dissolved Cu over a wide range and the average concentration ratio of the center was about 2%. From the linear relationship between the intensity of the 1.014 eV photoluminescence Cu center and the concentration of the DLTS center, the identities of both centers were assumed. The comparison of the maximum concentration of the Cu center observed in the present study (${\sim}10^{13}$ cm-3) with reported solubility of substitutional Cu (Cus) (${<}10^{10}$ cm-3) showed that the model containing Cus such as Cus–Cui (i: interstitial) was not appropriate for the center.
- 2006-01-25
著者
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Kawai Naoyuki
Renesas Technol. Corp. Tokyo Jpn
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NAKAMURA Minoru
Hitachi Research Laboratory
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SAITO Shigeaki
Renesas Technology Corp.
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ARIE Hiroyuki
Renesas Technology Corp.
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Hozoji Hiroshi
Hitachi Research Laboratory Hitachi Ltd.
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Murakami Susumu
Hitachi Research Laboratory Hitachi Ltd.
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Murakami Susumu
Hitachi Research Laboratory, Hitachi, Ltd., 1-1, 7-Chome, Omika-cho, Hitachi, Ibaraki 319-1292, Japan
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Hozoji Hiroshi
Hitachi Research Laboratory, Hitachi, Ltd., 1-1, 7-Chome, Omika-cho, Hitachi, Ibaraki 319-1292, Japan
関連論文
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- Concentration Study of Deep-Level Cu Center in Cu-Diffused Si Crystals by Deep-Level Transient Spectroscopy and Photoluminescence Measurements
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- Unusual Band-Edge Photoluminescence Intensity Emitted by Cu-Diffused Silicon Crystals
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