Evaluation of Spin-Transfer Switching in CoFeB/MgO/CoFeB Magnetic Tunnel Junctions
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概要
- 論文の詳細を見る
Current-induced magnetization switching was demonstrated on Co–Fe–B/MgO/Co–Fe–B magnetic tunnel junctions (MTJs), which exhibited giant tunnel magnetoresistance ratios of about 100%. Switching current density at a pulse duration of 100 ms was about $6\times 10^{6}$ A/cm2 at room temperature. The switching current density was reduced to one-third of the smallest value for the MgO-based MTJs reported to date. Dependence of the switching current on pulse duration and on the external magnetic field was discussed based on a theoretical model incorporating thermally activated spin-transfer switching. The spin-transfer switching in the MgO-based MTJs realizes low writing power consumption and a high read-out signal in high-density magnetoresistive random access memory.
- Japan Society of Applied Physicsの論文
- 2005-09-10
著者
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Yuasa Shinji
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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FUKUSHIMA Akio
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Ando Koji
Nanoelectronics Research Institute Aist
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Suzuki Yoshishige
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kubota Hitoshi
Nanoelectronics Research Institute (neri) National Institute Of Advanced Industrial Science And Tech
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Djayaprawira David
Electron Device Equipment Division, Canon ANELVA Corporation
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Maehara Hiroki
Electron Device Division, ANELVA Corp., 5-8-1 Yotsuya, Fuchu-shi, Tokyo 183-8508, Japan
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Ootani Yuichi
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Tsunekawa Koji
Electron Device Division, ANELVA Corp., 5-8-1 Yotsuya, Fuchu-shi, Tokyo 183-8508, Japan
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Watanabe Naoki
Electron Device Division, ANELVA Corp., 5-8-1 Yotsuya, Fuchu-shi, Tokyo 183-8508, Japan
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Suzuki Yoshishige
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Djayaprawira David
Electron Device Division, ANELVA Corp., 5-8-1 Yotsuya, Fuchu-shi, Tokyo 183-8508, Japan
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Yuasa Shinji
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Kubota Hitoshi
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Fukushima Akio
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Ando Koji
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba, Ibaraki 305-8568, Japan
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