Preparation of an Epitaxy-Ready Surface of a ZnO(0001) Substrate
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概要
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We show that there can be a contamination of silica particles on the surface of chemo-mechanically polished ZnO substrates. Consideration of the base of electrochemistry led us to a hypothesis that the alkaline polishing solution produces a layer of Zn(OH)2 capturing silica particles. In-situ observation of the etching process in an acidic solution by means of an atomic force microscope as well as zeta potential measurements supports this hypothesis and gives a clear guidance to solve the problem. We find that an epitaxy-ready surface can be reproducibly prepared by dipping ZnO substrates in an HCl solution ($\text{HCl}:\text{H$_{2}$O}= 7:200$) for 30 s.
- 2011-03-25
著者
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Ohtomo Akira
Department Of Applied Chemistry Tokyo Institute Of Technology
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Nakahara Ken
Interdisciplinary Devices R&d Center Rohm Co. Ltd.
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Akasaka Shunsuke
Interdisciplinary Devices R&d Center Rohm Co. Ltd.
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Kawasaki Masashi
Quantum-phase Electronics Center (qpec) And Department Of Applied Physics University Of Tokyo
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Tsukazaki Atsushi
Quantum-Phase Electronics Center and Department of Applied Physics, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Kawasaki Masashi
Quantum-Phase Electronics Center and Department of Applied Physics, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Yuji Hiroyuki
Interdisciplinary Devices R&D Center, ROHM Co., Ltd., Kyoto 615-8585, Japan
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Yuji Hiroyuki
Interdisciplinary Devices R&D Center, ROHM Co., Ltd., Kyoto 615-8585, Japan
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Nakahara Ken
Interdisciplinary Devices R&D Center, ROHM Co., Ltd., Kyoto 615-8585, Japan
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Ohtomo Akira
Department of Applied Chemistry, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan
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