Photolytic oxidation of alkylbenzenesulfonic acids by aqueous sodium hypochlorite.
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概要
- 論文の詳細を見る
Photolyses of alkylbenzenesulfonic acids, such as benzene-, <I>p</I>-toluene-, and <I>p</I>-ethylbenzenesulfonic acids, in aqueous solution by sodium hypochlorite have been studied. In the presence of a large excess of hypochlorite, benzenesulfonic acid is completely photolyzed to give carbon dioxide and sulfuric acid. Irradiation of an equimolar mixture of substrate and hypochlorite in an aqueous solution yields the corresponding alkylbenzene, alkylphenol, arylalkyl alcohol and arylalkylaldehyde, some of which may be produced by an attack of the oxidant on alkyl chain. In some cases, small amounts of diaryl sulfones and chlorinated compounds are also detected.
- 公益社団法人 日本化学会の論文
著者
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Ogata Yoshiro
Department Of Mechanical Engineering Ii Faculty Of Engineering Kyoto University:(present Address)res
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Nakamura Masao
Department of Applied Chemistry, Faculty of Engineering, Nagoya University
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