21011 高濃度オゾン水を用いたレジスト除去に及ぼすオゾン水流動の影響(OS10 マイクロ・ナノ熱流体工学(2),オーガナイズドセッション)

概要

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The photoresist stripping process in photo lithography plays an important role in manufacturing large-scale integration. In the present study, experimental information is obtained to establish high concentrated ozone water technology, in stead of chemicals such as sulfuric acid or hydrochloric acid. We examine flow structure between a stationary and a rotating disk for the sake of improving removal rate of photoresist using flow structure between disks. A radial flow velocity and a rotational flow velocity are obtained by visualization of a flow in the narrow gap. Flow structure is compared with a removal rate of photoresist by using high concentrated ozone water. It is considered that removal rate of photoresist is affected by ozone water flow structure.
2010-03-09