Gate Orientation Dependence of InGaAs/AlGaAs High Electron Mobility Transistors
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概要
- 論文の詳細を見る
The gate orientation dependence ofInGaAs/AlGaAs high electron mobility transistors (HEMTs) formed by the wet-chemical recess etching has been evaluated. The short channel effect strongly depends on the gate orientation and is significant in the order of [011], [001] and [011] oriented devices. Such orientation dependence results from a difference of the side-etching lengths, which are 0.01μm, 0.03μm and 0.06μm for [011], [001] and [011] oriented devices, respectively. The other characteristics of HEMTs such BV_<gd> gm and f_T also depend on the gate orientation because of a differece of the recessed shape.
- 社団法人応用物理学会の論文
- 2000-09-15
著者
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Kimura T
Components Division Oki Electric Industry Co. Ltd.
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Shigemasa Ryoji
Iii-v Devices Department Components Division Oki Electric Industry
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Ohshima Tomoyuki
Components Division Oki Electric Industry Co. Ltd.
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Ohshima Tomoyuki
Iii-v Devices Department Optical Components Oki Electric Industry Co. Ltd.
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Tsunotani Masanori
Components Division Oki Electric Industry Co. Ltd.
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Tsunotani Masanori
Iii-v Devices Department Optical Components Oki Electric Industry Co. Ltd.
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YOSHIDA Masaaki
III-V Devices Department, Components Division, Oki Electric Industry
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KIMURA Tamotsu
III-V Devices Department, Components Division, Oki Electric Industry
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Yoshida Masaaki
Iii-v Devices Department Components Division Oki Electric Industry
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